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主旨 尖端所專題演講- Recent development of high power impulse magnetron sputtering (HiPIMS) technique
公告日期 2018-05-20
公告內容

尖端所專題演講公告

題 目: Recent development of high power impulse magnetron sputtering (HiPIMS) technique

主講者:李志偉 教授
現  職:  明志科技大學 材料工程系

Thin film technology is an enabling technology which can improve the physical, chemical, electrical and mechanical properties of materials in all kinds of industries in nowadays. Among several thin film deposition methods, the high-power impulse magnetron sputtering (HiPIMS), which was developed in 1999, can provide a rather high density plasma and high ion bombardment energy to induce a denser and finer film microstructure. The HiPIMS represents the state-of-the-art in the surface engineering and functional coating fabrication technology, which has been a great interest to the researchers and industries. In this talk, the basic principle and some important pros and cons of HiPIMS will be introduced. The concept and the applications of a newly developed superimposed HiPIMS technique for improving the lower deposition rate of HiPIMS will also be discussed in this talk.

 

時 間:107年05月31日(四)下午03:10

地 點:成功大學材料新館二樓 敏雄講堂

 

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最後修改時間 2018-05-20 14:17:19